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Influence of the growth conditions of LT-AlN on quality of HT-AlN growth on Si (1 1 1) by metalorganic chemical vapor deposition

Author:

M.Y. Chernykh,I.S. Ezubchenko,I.O. Mayboroda,M.L. Zanaveskin

Publication:

Journal of Crystal Growth

Publisher:

Elsevier

Date:

1 February 2019

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