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Discharge power dependence of Hα intensity and electron density of Ar+H2 discharges in H-assisted plasma CVD reactor

Author:

Jun Umetsu,Kazunori Koga,Kazuhiko Inoue,Hidefumi Matsuzaki,Kosuke Takenaka,Masaharu Shiratani

Publication:

Surface and Coatings Technology

Publisher:

Elsevier

Date:

30 August 2008

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