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X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy

Author:

S.M.P. Kalaiselvi,T.L. Tan,A. Talebitaher,P. Lee,S.P. Heussler,M.B.H. Breese,R.S. Rawat

Publication:

Physics Letters A

Publisher:

Elsevier

Date:

6 March 2015

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