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Sublimation and diffusion of arsenic implanted into silicon at rapid electron beam annealing

Author:

R. Grötzschel,V.A. Kagadey,N.I. Lebedeva,D.I. Proskurovsky

Publication:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Publisher:

Elsevier

Date:

2 April 1991

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