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Molecular structures of composite corrosion inhibitors governing corrosion inhibition performance and material removal rate trend in chemical mechanical polishing of copper

Author:

Yongshun Zhang,Liang Jiang,Yuting Wei,Liao Zhou,Jiaxin Zheng,Rongpei Wang,Xia Zhong,Shijie Zhao,Linmao Qian

Publication:

Electrochimica Acta

Publisher:

Elsevier

Date:

20 October 2026

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