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A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films

Author:

Yuxiao Fang,Wangying Xu,Tianshi Zhao,Ivona Z. Mitrovic,Li Yang,Chun Zhao,Cezhou Zhao

Publication:

Radiation Physics and Chemistry

Publisher:

Elsevier

Date:

March 2022

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