Effect of thermal annealing on the electrical characteristics of an amorphous ITZO:Li thin film transistor fabricated using the magnetron sputtering method
Author:
Ran Li,Shiqian Dai,Jinbao Su,Yaobin Ma,Ye Wang,Dongzhan Zhou,Xiqing Zhang
Publication:
Materials Science in Semiconductor Processing
© 2019 Elsevier Ltd. All rights reserved.