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Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

Author:

Stefan Pfirrmann,Anja Voigt,Anett Kolander,Gabi Grützner,Olga Lohse,Irina Harder,Vitaliy A. Guzenko

Publication:

Microelectronic Engineering

Publisher:

Elsevier

Date:

2 April 2016

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