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Chemically stable, high-melting-point high-entropy oxides for fluorine-plasma etch resistance

Author:

JaeHyeon Kang,Nafees Hassan,UnSeo Kim,JeongMin Seo,Yeseob lee,YongJun Kim,Yeon-Gil Jung,Dowon Song

Publication:

Ceramics International

Publisher:

Elsevier

Date:

June 2026

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