Atomic surface control of Ge(100) in MOCVD reactors coated with (Ga)As residuals
Author:
Agnieszka Paszuk,Oliver Supplie,Sebastian Brückner,Enrique Barrigón,Matthias M. May,Manali Nandy,Aaron Gieß,Anja Dobrich,Peter Kleinschmidt,Ignacio Rey-Stolle,Thomas Hannappel
Publication:
Applied Surface Science
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