Atomic layer deposition paves the way for next-generation smart and functional textiles
Author:
Sijie Qiao,Zhicheng Shi,Aixin Tong,Yuxin Luo,Yu Zhang,Mengqi Wang,Zhiyu Huang,Weilin Xu,Fengxiang Chen
Publication:
Advances in Colloid and Interface Science
© 2025 Elsevier B.V. All rights are reserved, including those for text and data mining, AI training, and similar technologies.