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Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring

Author:

E.V. Johnson,S. Pouliquen,P.A. Delattre,J.P. Booth

Publication:

Journal of Non-Crystalline Solids

Publisher:

Elsevier

Date:

1 September 2012

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